研微 (PSR Semiconductor) develops semiconductor manufacturing equipment, including thermal and plasma-enhanced atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), silicon and silicon carbide epitaxy, and selective etch systems
研微 (PSR Semiconductor) develops semiconductor manufacturing equipment, including thermal and plasma-enhanced atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), silicon and silicon carbide epitaxy, and selective etch systems. Its equipment serves logic, memory, advanced packaging, image sensor, power-device, MEMS, and wide-bandgap semiconductor manufacturing.